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논문 기본 정보

자료유형
학술대회자료
저자정보
Choi, Sun-Young (Optoelectronic Materials Center, Korea Institute of Science and Technology) Kim, Sang-Sig (Department of Electrical Engineering, Korea University) Lee, Jeon-Kook (Optoelectronic Materials Center, Korea Institute of Science and Technology,)
저널정보
한국재료학회 한국재료학회 학술발표대회 한국재료학회 2011년도 춘계학술발표대회
발행연도
2011.1
수록면
282 - 282 (1page)

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Resistance random access memory (ReRAM) is a promising candidate for next-generation nonvolatile memory because of its advantageous qualities such as simple structure, superior scalability, fast switching speed, low-power operation, and nondestructive readout. We investigated the resistive switching behavior of tantalum oxide that has been widely used in dynamic random access memories (DRAM) in the present semiconductor industry. As a result, it possesses full compatibility with the entrenched complementary metal-oxide-semiconductor processes. According to previous studies, TiN is a good oxygen reservoir. The TiN top electrode possesses the specific properties to control and modulate oxygen ion reproductively, which results in excellent resistive switching characteristics. This study presents fully room temperature fabricated the TiN/$TaO_x$/Pt devices and their electrical properties for nonvolatile memory application. In addition, we investigated the TiN electrode dependence of the electrical properties in $TaO_x$ memory devices. The devices exhibited a low operation voltage of 0.6 V as well as good endurance up to $10^5$ cycles. Moreover, the benefits of high devise yield multilevel storage possibility make them promising in the next generation nonvolatile memory applications.

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