지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.29 No.1
- 발행연도
- 2020.1
- 수록면
- 5 - 9 (5page)
이용수
초록· 키워드
오류제보하기
Bulk and surface chemistry database (DB) are necessary to compute plasma parameters using plasma simulators. As the high quality of the DB is closely related to the accuracy enhancement of simulations, we attempted to gather reliable data from previously published articles. However, previous systems could not accommodate various types of information such as electron collision cross sections, rate coefficients of heavy particle reactions, sticking coefficients on the surfaces, and thermodynamic data. Therefore, we developed a new version of the DB system to provide plasma data for researchers in related fields; this new DB system is designed to retrieve data such as electron collision cross sections, rate coefficient, and thermodynamics data. About 35,000 collision cross sections and 74,000 rate coefficients for 90 chemical species and thermodynamic data for 55 chemicals are provided in the numerical and graphical forms in this DB system.
목차
ABSTRACT
1. Introduction
2. Database (DB) system and discussion
3. Conclusions
References
참고문헌 (16)
참고문헌 신청
A. Grill / 1994 / Cold Plasma in Materials Fabrication from Fundamentals to Applications / John Willy & Sons, Inc :1~27
IAEA Atomic and Molecular Data Unit
IAEA ALADDIN
R. A. Hulse / 1990 / AIP Conf. Proc 206:63
D. P. Humbert / 2004 / Proceedings of the 14th International Conference on Radionuclide Metrology and its Applications 60:311~316
IAEA Atomic and Molecular Data Unit
IAEA ALADDIN
R. A. Hulse / 1990 / AIP Conf. Proc 206:63
D. P. Humbert / 2004 / Proceedings of the 14th International Conference on Radionuclide Metrology and its Applications 60:311~316
함께 읽어보면 좋을 논문
논문 유사도에 따라 DBpia 가 추천하는 논문입니다. 함께 보면 좋을 연관 논문을 확인해보세요!
-
Plasma Properties Data Center Activities for Plasma Application in the National Fusion Research Institute
한국진공학회 학술발표회초록집
2019 .08
-
낮은 GWP를 가진 CxF2xO 을 이용한 SiO2 식각 공정 특성에 관한 연구
한국진공학회 학술발표회초록집
2020 .02
-
Plasma 모델링과 시뮬레이션을 위한 웹기반 Plasma Chemistry 데이터베이스
한국진공학회 학술발표회초록집
2019 .08
-
Plasma-induced reaction at plasma-liquid and plasma-polymeric film interface by AC-driven atmospheric pressure plasma
한국진공학회 학술발표회초록집
2019 .08
-
Effect of hybrid plasma source on O radical generation in oxygen plasma
한국진공학회 학술발표회초록집
2018 .08
-
Enhancement of the Virtual Metrology Performance for Plasma-assisted Processes by Using Plasma Information (PI) Parameters
한국진공학회 학술발표회초록집
2015 .08
-
Flexible Plasma Sheets
Applied Science and Convergence Technology
2018 .03
-
Challenges and Solution on Large Scale of Atmospheric Pressure Plasma for Environmental Plasma Applications
한국진공학회 학술발표회초록집
2020 .08
-
Characteristics of the Plasma Source for Ground Ionosphere Simulation Surveyed by Disk-Type Langmuir Probe
Journal of Astronomy and Space Sciences
2017 .12
-
Plasma Farming : Comprehensive Plasma Application to Agriculture
한국진공학회 학술발표회초록집
2017 .08
-
마이크로스트립 라인을 이용한 마이크로웨이브 플라즈마 기술 및 응용
진공이야기
2020 .09
-
Inductively Coupled Plasma 장치에서 Hybrid Plasma Model을 활용한 C₂F8/ O₂ 가스의 특성 해석
한국진공학회 학술발표회초록집
2019 .08
-
Development of methodology for Individual control of ion and radical in dual freqeuncy(13.56 ㎒ + 400 ㎑) pulsed Ar/CF₄/O₂ plasma
한국진공학회 학술발표회초록집
2021 .02
-
Oxide 및 Nitride 고선택비 식각 공정에서의 CF4(CHF3)/O2/Ar inductively coupled pulsed plasmas
한국진공학회 학술발표회초록집
2020 .02
-
Microwave Plasma Source Optimization for Thin Film Deposition Applications
Applied Science and Convergence Technology
2022 .03
-
Measurement of characteristics of plasma discharge in liquid
한국진공학회 학술발표회초록집
2015 .08
-
Electron impact scattering cross sections of C₂F₂ for plasma application
한국진공학회 학술발표회초록집
2016 .08
-
Development of process plasma diagnosis and control system using plasma emission light diagnostics
한국진공학회 학술발표회초록집
2016 .08
-
Inductively Coupled Plasma Simulation Based on Electron Energy Distribution Function and Process Pressure
Applied Science and Convergence Technology
2020 .11
-
Structural evolution and highly active reaction in direct plasma process on 4H-SiC
한국진공학회 학술발표회초록집
2017 .02
이 논문의 저자 정보
최근 본 자료
댓글(0)
0
UCI(KEPA) : I410-ECN-0101-2020-420-000691861