지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.23 No.6
- 발행연도
- 2014.11
- 수록면
- 357 - 365 (9page)
이용수
초록· 키워드
오류제보하기
A non-invasive method for ion energy distribution measurement at a RF biased surface is proposed for monitoring the property of ion bombardments in capacitively coupled plasma sources. To obtain the ion energy distribution, the measured electrode voltage is analyzed based on the circuit model which is developed with the linearized sheath capacitance on the assumption that the RF driven sheath behaves like a simple diode for a bias power whose frequency is much lower than the ion plasma frequency. The method is verified by comparing the ion energy distribution function obtained from the proposed model with the experimental result taken from the ion energy analyzer in a dual cathode capacitively coupled plasma source driven by a 100 MHz source power and a 400 kHz bias power.
목차
I. Introduction
II. Experimental Setup
III. Analysis Model of Ion Energy Distribution
IV. Results and Discussion
V. Conclusion
References
참고문헌 (16)
참고문헌 신청
1. [학술지(정기간행물)] - R. Tsui / 1968 / / Phys. Rev 168 : 107 ~ 108
2. [학술지(정기간행물)] - E. Kawamura / 1999 / / Plasma Sources Sci. Technol 8 : R45 ~ R64
3. [학술지(정기간행물)] - R. Farouki / 1992 / / Phys. Rev. A 45 : 5913 ~ 5929
4. [학술지(정기간행물)] - P. Benoit-Cattin / 1968 / / J. Appl. Phys 39 : 5723 ~
5. [학술지(정기간행물)] - J. W. Coburn / 1972 / / J. Appl. Phys 43 : 4965 ~
2. [학술지(정기간행물)] - E. Kawamura / 1999 / / Plasma Sources Sci. Technol 8 : R45 ~ R64
3. [학술지(정기간행물)] - R. Farouki / 1992 / / Phys. Rev. A 45 : 5913 ~ 5929
4. [학술지(정기간행물)] - P. Benoit-Cattin / 1968 / / J. Appl. Phys 39 : 5723 ~
5. [학술지(정기간행물)] - J. W. Coburn / 1972 / / J. Appl. Phys 43 : 4965 ~
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UCI(KEPA) : I410-ECN-0101-2019-420-001275360