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논문 기본 정보

자료유형
학술저널
저자정보
Sangshik Park (Kyungpook National University)
저널정보
한국진공학회(ASCT) Applied Science and Convergence Technology Applied Science and Convergence Technology Vol.23 No.2
발행연도
2014.3
수록면
90 - 96 (7page)

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초록· 키워드

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Flexible ZrO₂ films as dielectric materials for high-energy-density capacitors were deposited on polyethylene terephthalate (PET) substrates by RF magnetron sputtering. The growth behavior, microstructure and electrical properties of the flexible ZrO₂ films were dependent on the sputtering pressure and gas ratio. Although ZrO₂ films were deposited at room temperature, all films showed a tetragonal crystalline structure regardless of the sputtering variables. The surface of the film became a surface with large white particles upon an increase in the O₂/Ar gas ratio. The RMS roughness and crystallite size of the ZrO₂ films increased with an increase in the sputtering pressure. The electrical properties of the ZrO₂ films were affected by the microstructure and roughness. The ZrO₂ films exhibited a dielectric constant of 21∼38 at 1 kHz and a leakage current density of 10<SUP>-6</SUP>∼10<SUP>-5 </SUP>A/cm² at 300 kV/cm.

목차

I. Introduction
II. Experimental Procedures
III. Results and Discussion
IV. Conclusions
References

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