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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2012.1
- 수록면
- 21 - 32 (12page)
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Fluorinated compounds mainly used in the semiconductor industry are potent greenhouse gases. Recently, thermal plasma gas scrubbers have been gradually replacing conventional burn-wet type gas scrubbers which are based on the combustion of fossil fuels because high conversion efficiency and control of byproduct generation are achievable in chemically reactive high temperature thermal plasma. Chemical equilibrium composition at high temperature and numerical analysis on a complex thermal flow in the thermal plasma decomposition system are used to predict the process of thermal decomposition of fluorinated gas. In order to increase economic feasibility of the thermal plasma decomposition process, increase of thermal efficiency of the plasma torch and enhancement of gas mixing between the thermal plasma jet and waste gas are discussed. In addition,noble thermal plasma systems to be applied in the thermal plasma gas treatment are introduced in the present paper.
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참고문헌 (25)
참고문헌 신청
B. A. Wofford / 1999 / Surface-Wave Plasma Abatement of CHF3 and CF4 Containing Semiconductor Process Emissions / Environ. Sci. Tech 33 : 1892 ~ 1897
C. C. Allgood / 2003 / Fluorinated Gases for Semiconductor Manufacture: Process Advances in Chemical Vapor Deposition Chamber Cleaning / J. Fluorine Chem 122 : 105 ~ 112
D. R. Burgess, Jr / 1996 / Thermochemical and Chemical Kinetic Data for Fluorinated Hydrocarbons / Prog. Energy Combust. Sci 21 : 453 ~ 529
E. J. Tonnis / 1998 / Evaluation of a Litmas "Blue" Point-of-Use (POU) Plasma Abatement Device for Perfluorocompound (PFC) Destruction
G. M. Bickle / 1994 / Catalytic Destruction of Chlorofluorocarbons and Toxic Chlorinated Hydrocarbons / Appl. Catal. B: Environ 4 : 141 ~ 153
C. C. Allgood / 2003 / Fluorinated Gases for Semiconductor Manufacture: Process Advances in Chemical Vapor Deposition Chamber Cleaning / J. Fluorine Chem 122 : 105 ~ 112
D. R. Burgess, Jr / 1996 / Thermochemical and Chemical Kinetic Data for Fluorinated Hydrocarbons / Prog. Energy Combust. Sci 21 : 453 ~ 529
E. J. Tonnis / 1998 / Evaluation of a Litmas "Blue" Point-of-Use (POU) Plasma Abatement Device for Perfluorocompound (PFC) Destruction
G. M. Bickle / 1994 / Catalytic Destruction of Chlorofluorocarbons and Toxic Chlorinated Hydrocarbons / Appl. Catal. B: Environ 4 : 141 ~ 153
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