지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
초록· 키워드
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In this paper, we found surface shapes are affected by several parameters of RIE, such as RF power, pressure, temp, and process times. The reflectance of pyramid and half sphere structures show differences among shapes, size, height, and depth of those structures. We made about 1 pyramid and half sphere shapes of silicon surface with RIE. For comparing the reflectance, pyramid and half sphere structures are fabricated with same height. Pyramid structure cell shows higher cell efficiency of 12.5% by 1.1% than one of half sphere structure of 11.4%. The light absorption is more increased through the pyramid structure than half sphere structure.
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참고문헌 (9)
참고문헌 신청
B. O. Cho / 2000 / Direct pattern etching for micromachining applications without the use of a resist mask / J. Vac. Sci Technol. B 18 : 2769 ~ 2773
G. Y. Yeum / 2006 / Plasma etching technique : 249 ~ 264
H. F. W. Dekkers / 2000 / Silicon surface texturing by reactive ion etching / Opto-electronics review 8 : 311 ~ 316
H. O. Jumg / 2013 / Improvement of silicon solar cell efficiency according to pyramid structure and antireflection coating process condition / 석사 / Kyungbook National University
J. S. Lee / 2007 / Solar cell engineering : 22 ~ 28
G. Y. Yeum / 2006 / Plasma etching technique : 249 ~ 264
H. F. W. Dekkers / 2000 / Silicon surface texturing by reactive ion etching / Opto-electronics review 8 : 311 ~ 316
H. O. Jumg / 2013 / Improvement of silicon solar cell efficiency according to pyramid structure and antireflection coating process condition / 석사 / Kyungbook National University
J. S. Lee / 2007 / Solar cell engineering : 22 ~ 28
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