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논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 대한전자공학회 JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE Journal of Semiconductor Technology and Science Vol.13 No.4
- 발행연도
- 2013.8
- 수록면
- 410 - 414 (5page)
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We report the wet etching of titanium nickel (TiNi) films for the production of nano-electro-mechanical (NEM) device. SiO<SUB>2</SUB> and Si<SUB>3</SUB>N<SUB>4</SUB> have been selected as sacrificial layers of TiNi metal and etched with polyethylene glycol and hydrofluoric acid (HF) mixed solution. Volume percentage of HF are varied from 10% to 35% and the etch rate of the SiO<SUB>2</SUB>, Si<SUB>3</SUB>N<SUB>4</SUB> and TiNi are reported here. Within the various experiment results, 15% HF mixed polyethylene glycol solution show highest etch ratio between sacrificial layre and TiNi metal. Especially Si<SUB>3</SUB>N<SUB>4</SUB> films shows high etch ratio with TiNi films. Wet etching results are measured with SEM inspection. Therefore, this experiment provides a novel method for TiNi in the nano-electro-mechanical device.
목차
Abstract
Ⅰ. INTRODUCTION
Ⅱ. EXPERIMENT
Ⅲ. RESULTS AND DISCUSSION
Ⅳ. CONCLUSIONS
REFERENCES
참고문헌 (11)
참고문헌 신청
1. [학술지(정기간행물)] - Vincent Pott / 2012 / The Shuttle Nanoelectormechanical Nonvolatile Memory / IEEE Trasactions on electron devices 39 (4) : 1137 ~ 1143
2. [학술지(정기간행물)] - Kousuke Miyaji / 2012 / Scaling Trends and Tradeoffs between Short Channel Effect and Channel Boosting Characteristics in Sub-20 nm Bulk/Silicon-on- Insulator NAND Flash / Japanese Journal of Applied Physics 51 : 04DD12- 1 ~ 04DD12- 7
3. [학술지(정기간행물)] - Kwangseok Lee / 2011 / Nanoelectromechanical Memory Cell (T Cell) for Low-Cost Embedded Nonvolatile Memory Applications / IEEE Trasactions on Electron Devices 58 (4) : 1264 ~ 1267
4. [학술대회논문] - W. Y. Choi / 2007 / Compact Nano-Electro-Mechanical Non- Volatile Memory (NEMory) for 3D Integration / IEDM Tech.Dig. : 603 ~
5. [학술지(정기간행물)] - Carolina Nunes Kirchner / 2007 / Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications / Electroanalysis 19 (10) : 1023 ~ 1031
2. [학술지(정기간행물)] - Kousuke Miyaji / 2012 / Scaling Trends and Tradeoffs between Short Channel Effect and Channel Boosting Characteristics in Sub-20 nm Bulk/Silicon-on- Insulator NAND Flash / Japanese Journal of Applied Physics 51 : 04DD12- 1 ~ 04DD12- 7
3. [학술지(정기간행물)] - Kwangseok Lee / 2011 / Nanoelectromechanical Memory Cell (T Cell) for Low-Cost Embedded Nonvolatile Memory Applications / IEEE Trasactions on Electron Devices 58 (4) : 1264 ~ 1267
4. [학술대회논문] - W. Y. Choi / 2007 / Compact Nano-Electro-Mechanical Non- Volatile Memory (NEMory) for 3D Integration / IEDM Tech.Dig. : 603 ~
5. [학술지(정기간행물)] - Carolina Nunes Kirchner / 2007 / Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications / Electroanalysis 19 (10) : 1023 ~ 1031
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UCI(KEPA) : I410-ECN-0101-2014-560-002404968