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학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
초록· 키워드
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TiO₂ thin films are fabricated using R.F.sputtering method. TiO₂ thin films are coated on Al₂O₃ substrate printed IDE(interdigitated electrode). Impedance of thin films decreases according to increase relative humidity and it increases according to decrease measuring frequency. When substrate temperature is room temperature, impedance of thin films is from 45.68[MHz] to 37.76[MHz] within the limits from 30[%RH] to 75[%RH] at 1[kHz]. Whereas when substrate temperature is 100[℃], impedance of thin films is from 692[kHz] to 539[kHz] within the limits from 30[%RH] to 75[%RH] at 1[kHz]. Impedance variation of thin films is bigger in low frequency regions than in high frequency regions. When substrate temperature is 100[℃], impedance of thin films is lower than that of room temperature.
목차
Abstract
1. 서론
2. 실험방법
3. 결과 및 고찰
4. 결론
References
참고문헌 (14)
참고문헌 신청
1. [학술지(정기간행물)] - K. D. Schierbaum / 1995 / Engineering of Oxide Surfaces and Metal/Oxide Interfaces for Chemical Sensors : Recent Trends / Sensors and Actuators B 24 (1) : 239 ~ 247
2. [학술지(정기간행물)] - M.Li / 1996 / An Investigation of Response Time of TiO2 Thin-Film Oxygen Sensors / Sensors and Actuators B 32 (1) : 83 ~ 85
3. [학술지(정기간행물)] - J. Szczyrbowski / 1997 / Antireflective Coatings on Large Scale Substrates Produced by Reactive Twin-Magnetron Sputtering / Journal of Non Crystalline Solids 218 (2) : 25 ~ 29
4. [학술지(정기간행물)] - H. Ohsaki / 1999 / High Rate Sputter Deposition of TiO2 from TiO2-x Target / Thin Solid Films 351 (1) : 57 ~ 60
5. [학술지(정기간행물)] - D. Bhattacharyya / 2000 / Spectroscopic Ellipsometry of TiO2 Layers Prepared by Ion-Assisted Electron-Beam Evaporation / Thin Solid Films 360 (1) : 96 ~ 102
2. [학술지(정기간행물)] - M.Li / 1996 / An Investigation of Response Time of TiO2 Thin-Film Oxygen Sensors / Sensors and Actuators B 32 (1) : 83 ~ 85
3. [학술지(정기간행물)] - J. Szczyrbowski / 1997 / Antireflective Coatings on Large Scale Substrates Produced by Reactive Twin-Magnetron Sputtering / Journal of Non Crystalline Solids 218 (2) : 25 ~ 29
4. [학술지(정기간행물)] - H. Ohsaki / 1999 / High Rate Sputter Deposition of TiO2 from TiO2-x Target / Thin Solid Films 351 (1) : 57 ~ 60
5. [학술지(정기간행물)] - D. Bhattacharyya / 2000 / Spectroscopic Ellipsometry of TiO2 Layers Prepared by Ion-Assisted Electron-Beam Evaporation / Thin Solid Films 360 (1) : 96 ~ 102
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UCI(KEPA) : I410-ECN-0101-2014-500-003299385