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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2013.4
- 수록면
- 163 - 170 (8page)
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초록· 키워드
오류제보하기
The fine-particles, moisture and variety of hazardous gases are produced during electronic manufacture process. Most of the fine-particles are 0.1~10 ㎛ in size and the hazardous gases such as HF, SiH₄, CO, NH₃, etc. seriously affect environment, human’s body and manufacturing process. To remove these characterized gases and fineparticles, Water-Cyclone designed and tested for removal efficiency on fine-particles and NH₃ under -980Pa negative pressure condition.
As a result, under 0.1~1.0㎥/min flow condition, the efficiency on 5 ㎛ particles was 80~96%, 10 ㎛ particles was 86~96%, and 20 ㎛ particles was 91~99%. Besides, the removal efficiency on soluble gas NH₃ was 56.5% at 0.5㎥/min and 79.1% at 1.0㎥/min under 500 ppm flow concentration and 70.0% at 1.0㎥/min under 1,000 ppm flow concentration. Therefore, on particles, as the flow rate and particle size increased, the collection efficiency rate was increased. On soluble gas, as the flow rate increased, the removal efficiency was increased under the same concentration.
As a result, under 0.1~1.0㎥/min flow condition, the efficiency on 5 ㎛ particles was 80~96%, 10 ㎛ particles was 86~96%, and 20 ㎛ particles was 91~99%. Besides, the removal efficiency on soluble gas NH₃ was 56.5% at 0.5㎥/min and 79.1% at 1.0㎥/min under 500 ppm flow concentration and 70.0% at 1.0㎥/min under 1,000 ppm flow concentration. Therefore, on particles, as the flow rate and particle size increased, the collection efficiency rate was increased. On soluble gas, as the flow rate increased, the removal efficiency was increased under the same concentration.
목차
Abstract
1. 서론
2. 연구 방법
3. 결과 및 고찰
4. 결론
참고문헌
참고문헌 (20)
참고문헌 신청
1. [학술지(정기간행물)] - Allgood, C. C. / 2003 / Fluorinated Gases for Semiconductor Manufacture: Process Advances in Chemical Vapor Deposition Chamber Cleaning / J. Fluorine Chem 122 : 105 ~ 112
2. [학술대회논문] - Baek, D.H / 2002 / Data mining using semiconductor yield improvement system / Proceedings of the Joint Conference of the Korean Institute of Industrial Engineers and The Korean Operations Research and Management Science Society : 293 ~ 300
3. [학술지(정기간행물)] - Coker, K. / 1993 / Understand cyclone design / Chemical Engineering and Processing 89 (12) : 51 ~ 55
4. [학술지(정기간행물)] - 정재우 / 2003 / 대규모 산업공정에서 배출되는 비산먼지의 특성 / 한국폐기물자원순환학회지 20 (2) : 179 ~ 185
5. [보고서] - Hong, J.H / 2002 / Industrial facilities in the fine dust control technology : 54 ~ 66
2. [학술대회논문] - Baek, D.H / 2002 / Data mining using semiconductor yield improvement system / Proceedings of the Joint Conference of the Korean Institute of Industrial Engineers and The Korean Operations Research and Management Science Society : 293 ~ 300
3. [학술지(정기간행물)] - Coker, K. / 1993 / Understand cyclone design / Chemical Engineering and Processing 89 (12) : 51 ~ 55
4. [학술지(정기간행물)] - 정재우 / 2003 / 대규모 산업공정에서 배출되는 비산먼지의 특성 / 한국폐기물자원순환학회지 20 (2) : 179 ~ 185
5. [보고서] - Hong, J.H / 2002 / Industrial facilities in the fine dust control technology : 54 ~ 66
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