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학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
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연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 발행연도
- 2012.12
- 수록면
- 245 - 250 (6page)
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초록· 키워드
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Ferromagnetic resonance and X-ray specular reflectivity measurements were performed on Ni<SUB>81</SUB>Fe<SUB>19</SUB>/Ir<SUB>20</SUB>Mn<SUB>80</SUB>/ Co<SUB>90</SUB>Fe<SUB>10</SUB> exchange bias trilayers, which were grown using the pulsed-DC magnetron sputtering technique on Si(100)/SiO<SUB>2</SUB>(1000 nm) substrates, to investigate the evolution of the interface roughness and exchange bias and their dependence on the NiFe layer thickness. The interface roughness values of the samples decrease with increasing NiFe thickness. The in-plane ferromagnetic resonance measurements indicate that the exchange bias field and the peak-to-peak line widths of the resonance curves are inversely proportional to the NiFe thickness. Furthermore, both the exchange bias field and the interface roughness show almost the same dependence on the NiFe layer thickness. The out-of plane angular dependent measurements indicate that the exchange bias arises predominantly from a variation of exchange anisotropy due to changes in interfacial structure. The correlation between the exchange bias and the interface roughness is discussed.
목차
1. Introduction
2. Experimental
3. Results and Discussion
4. Conclusions
References
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UCI(KEPA) : I410-ECN-0101-2014-428-000599161