지원사업
학술연구/단체지원/교육 등 연구자 활동을 지속하도록 DBpia가 지원하고 있어요.
커뮤니티
연구자들이 자신의 연구와 전문성을 널리 알리고, 새로운 협력의 기회를 만들 수 있는 네트워킹 공간이에요.
논문 기본 정보
- 자료유형
- 학술저널
- 저자정보
- 저널정보
- 대한전자공학회 JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE Journal of Semiconductor Technology and Science Vol.12 No.1
- 발행연도
- 2012.3
- 수록면
- 34 - 40 (7page)
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초록· 키워드
오류제보하기
We have developed a highly sensitive inspection technique based on an electron beam inspection for detecting the contact failure of a poly-Si plugged layer. It was difficult to distinguish the contact failure from normal landing plugs with high impedance. Normally, the thermal annealing method has been used to decrease the impedance of poly-Si plugs and this method increases the difference of charged characteristics and voltage contrast. However, the additional process made the loss of time and broke down the device characteristics. Here, the interval scanning method without thermal annealing was effectively applied to enhance the difference of surface voltage between well-contacted poly-Si plugs and incomplete contact plugs. It is extremely useful to detect the contact failures of non-annealed plug contacts with high impedance.
목차
Abstract
Ⅰ. INTRODUCTION
Ⅱ. EXPERIMENTAL RESULTS
Ⅲ. CONCLUSIONS
ACKNOWLEDGEMENT
REFERENCES
참고문헌 (8)
참고문헌 신청
1. [학술대회논문] - M. Nozoe / 2000 / New Voltage Contrast Imaging Method for Detection of Electrical Failures / Proceedings of SPIE 3998 : 599 ~ 606
2. [학술지(정기간행물)] - M. Matsui / 2004 / Detecting Defects in Cu Metallization Structuresby Electron-Beam Wafer Inspection / Journal ofThe Electrochemical Society 151 : 440 ~ 442
3. [학술지(정기간행물)] - I. De / 2007 / Investigation of Detection Limits of Resistive Contact Plugs in Electron Beam Inspection Using Modeling and Simulation / IEEE Transactions on semiconductor manufacturing 20 : 0894 ~ 6507
4. [학술지(정기간행물)] - K. Shadman / 2007 / Analytic models for the kinetics of generating a voltage contrast signal from contact plugs used in integrated circuits / J. App.Phys 101 : 064913 ~
5. [학술지(정기간행물)] - W. D. Meisburger / 1992 / Low-voltage electron-optical system for the highspeedinspection of integrated circuits / J. Vac. Sci.Technol. B 10 : 2804 ~ 2808
2. [학술지(정기간행물)] - M. Matsui / 2004 / Detecting Defects in Cu Metallization Structuresby Electron-Beam Wafer Inspection / Journal ofThe Electrochemical Society 151 : 440 ~ 442
3. [학술지(정기간행물)] - I. De / 2007 / Investigation of Detection Limits of Resistive Contact Plugs in Electron Beam Inspection Using Modeling and Simulation / IEEE Transactions on semiconductor manufacturing 20 : 0894 ~ 6507
4. [학술지(정기간행물)] - K. Shadman / 2007 / Analytic models for the kinetics of generating a voltage contrast signal from contact plugs used in integrated circuits / J. App.Phys 101 : 064913 ~
5. [학술지(정기간행물)] - W. D. Meisburger / 1992 / Low-voltage electron-optical system for the highspeedinspection of integrated circuits / J. Vac. Sci.Technol. B 10 : 2804 ~ 2808
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UCI(KEPA) : I410-ECN-0101-2013-569-001723030